High temperature plasma enhanced chemical vapour deposition system on C-based materials Oxford Instruments Plasma Technology NanoFab

Name:	High temperature plasma enhanced chemical vapour deposition system on C-based materials Oxford Instruments Plasma Technology NanoFab
Technology / Methodology:	Etching & Deposition
Location:	CEITEC Brno University of Technology
Instrument description:	chemical vapour deposition system going to very high deposition temperatures dedicated to the deposition of carbon nanomaterials, possibilities of plasma enhancement by discharges of different frequency (including their regular switching)
Research group:	CF: CEITEC Nano

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