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Home page/Core Facilities/CEITEC Nano Research Infrastructure/Ion beam etching Scia Systems Coat 200

Ion beam etching Scia Systems Coat 200

Name: Ion beam etching Scia Systems Coat 200
Technology / Methodology: Etching & Deposition
Location: CEITEC Brno University of Technology
Instrument description: physical vapor deposition method allows thin films to be etched by the use of broad beams of positively charged ions in a high vacuum system
Research group: CF: CEITEC Nano

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