Events Calendar

Search for the specific conference, workshop or lecture ...

Ion-Beam Sputter Deposition System BESTEC

Name:	Ion-Beam Sputter Deposition System BESTEC
Location:	CEITEC Brno University of Technology
Instrument description:	UHV sputter deposition system is equipped with two RFICP Kaufman ion-beam sources (KRI®) with 4 cm diameter grids (3-grid primary and 2-grid assisted/secondary) and charge neutralizer (LFN 2000 - KRI®). This setup is suitable for Ion-beam sputter deposition, Ion-beam assisted deposition, reactive sputter deposition with nitrogen and in-situ initial/continual substrate (pre-)cleaning. Etching (ion-milling) is not possible due to undesirable chamber and targets contamination.
Research group:	CF: CEITEC Nano

More CEITEC News ...

29. ledna 2018 9:46

LECTURE: Dr. Ondrej Hovorka: Models of magnetic nanoparticles for biomedical applications

25. ledna 2018 18:21

WHEN: 30. 01. 2018 WHERE: CEITEC BUT, Purkynova 123, large meeting room SPEAKER: Dr Andriy Marko TALK: Advances in PELDOR…