Name: | Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 |
Technology / Methodology: | Nanolitography infrastructure |
Location: | CEITEC Brno University of Technology |
Instrument description: | Resist mask preparation for fabrication of nano and microstructures with ultimate dimensions below 50 nm. Includes resist spin coating facility, complete photolithography setup and electron beam lithography / shared by CEITEC users, open facilities |
Research group: | CF: CEITEC Nano |
If you would like to use this equipment contact the administrator: |
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29. ledna 2018 9:46
LECTURE: Dr. Ondrej Hovorka: Models of magnetic nanoparticles for biomedical applications
25. ledna 2018 18:21
WHEN: 30. 01. 2018 WHERE: CEITEC BUT, Purkynova 123, large meeting room SPEAKER: Dr Andriy Marko TALK: Advances in PELDOR…