Change institution
Advanced Nano and Microtechnologies Advanced Materials Structural Biology Gen. and Prot. of Plant Systems Molecular Medicine Brain and Mind Research Molecular Vet. Medicine

Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3

Name: Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
Technology / Methodology: Nanolitography infrastructure
Location: CEITEC Brno University of Technology
Instrument description: Resist mask preparation for fabrication of nano and microstructures with ultimate dimensions below 50 nm. Includes resist spin coating facility, complete photolithography setup and electron beam lithography / shared by CEITEC users, open facilities
Research group: CF: CEITEC Nano

If you would like to use this equipment contact the administrator:

*
*
*
*
*
*
 
More CEITEC News ...
Dr. Ondrej Hovorka: Models of magnetic nanoparticles for biomedical applications

29. ledna 2018 9:46

Dr. Ondrej Hovorka: Models of magnetic nanoparticles for biomedical…

LECTURE: Dr. Ondrej Hovorka: Models of magnetic nanoparticles for biomedical applications

Advanced Materials and Nanotechnology Seminar Series 2018: Dr Andriy Marko

25. ledna 2018 18:21

Advanced Materials and Nanotechnology Seminar Series 2018: Dr Andriy…

WHEN: 30. 01. 2018 WHERE: CEITEC BUT, Purkynova 123, large meeting room SPEAKER: Dr Andriy Marko TALK: Advances in PELDOR…