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Metal organic chemical vapor deposition (MOCVD)

Name:	Metal organic chemical vapor deposition (MOCVD)
Technology / Methodology:	Etching & Deposition
Location:	CEITEC Brno University of Technology
Instrument description:	System for deposition of thin layers of metal oxides on a horizontally oriented wafer/sample inside a cylindric steel reactor, with higher growth speed and lower control of layer thickness than a related ALD technique. Metal-organic precursors are delivered through a shower-head placed directly above a rotating heated substrate holder, they decompose in contact with the substrate and organic residuals are extracted from the reactor with high-performance pump system.
Research group:	CF: CEITEC Nano

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