Plasma Enhanced CVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100

Name:	Plasma Enhanced CVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
Technology / Methodology:	Etching & Deposition
Location:	CEITEC Brno University of Technology
Instrument description:	plasma enchanced chemical vapour deposition using chemically reactive plasma for deposition of silicon based materials
Research group:	CF: CEITEC Nano

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