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Home page/Core Facilities/CEITEC Nano Research Infrastructure/Resist coating and development system SÜSS MicroTec RCD8

Resist coating and development system SÜSS MicroTec RCD8

Name: Resist coating and development system SÜSS MicroTec RCD8
Technology / Methodology: Nanolitography infrastructure
Location: CEITEC Brno University of Technology
Instrument description: The RCD8 coat and develop platform can be custom tailored anywhere from e.g. a basic manual spin coater to a GYRSET® enhanced coater and puddle & spray developer tool. It can handle small pieces as well as standard wafers up to 200 mm and serves therefore ideally for daily R&D work up to small scale production.
Research group: CF: CEITEC Nano

If you would like to use this equipment contact the administrator:
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