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Equipment Research group / CF Profile card
Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200
CF: CEITEC Nano
Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 CF: CEITEC Nano
Electron beam evaporator BESTEC CF: CEITEC Nano
Experimental PECVD: ion and mass analyzer, optical emission spectroscopy, in situ ellipsometry, langmuir probe CF: CEITEC Nano
High temperature plasma enhanced chemical vapour deposition system on C-based materials Oxford Instruments Plasma Technology NanoFab CF: CEITEC Nano
Ion beam etching Scia Systems Coat 200 CF: CEITEC Nano
Low pressure chemical vapor deposition - Nitrides CF: CEITEC Nano
Magnetron sputtering system BESTEC CF: CEITEC Nano
Metal organic chemical vapor deposition (MOCVD) CF: CEITEC Nano
Plasma Enhanced CVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 CF: CEITEC Nano
Reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 80 CF: CEITEC Nano
Resist stripper Diener electronic NANO Plasma cleaner Resist stripper Diener electronic NANO Plasma cleaner
CF: CEITEC Nano
Fume Hood 6 CF: CEITEC Nano
Fumehood for Solvents I. CF: CEITEC Nano
Fumehood for Solvents II. CF: CEITEC Nano
A complex customized UHV equipment CF: CEITEC Nano
PLD deposition system: UHV, in-situ RHEED, IR laser heating CF: CEITEC Nano
Secondary Ion Mass Spectroscopy ION-TOF TOF.SIMS5 CF: CEITEC Nano
Analytical ultracentrifugation Analytical ultracentrifugation
CF: Core Facility Biomolecular Interaction and Crystalization
Automated calorimetric system Auto-iTC200 Automated calorimetric system Auto-iTC200
CF: Core Facility Biomolecular Interaction and Crystalization
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