Development of methods for the fabrication of nanostructures: planar physical and plasmochemical methods using EBL, UV lithography, FIB, SPM lithography, and imprint technology. MBE, CVD, ALD, PECVD, hybrid methods for selective growths, etc. All the methods developed are utilized directly for fabrication of nanostructures, advanced planar materials and devices.
Specification and optimization of the functional properties of nanostructures for nanoelectronics, nanophotonics and (bio)sensing their correlation with geometrical/structural parameters of nanostructures and operational parameters. Novel and unique properties of nanostructures not observable in conventional materials and microstructures open the ways for qualitatively new applications.
Development of techniques and methodologies for microscopy, analysis and metrology of nanomaterials/nanostructures, and for diagnostics of their properties – new techniques of nanometrology by SPM, optical methods, combination of more techniques (SEM, AFM, etc.). This will be used to meet the other objectives of the Advanced Nanotechnologies and Microtechnologies Research Programme and for the characterization of nano- and microstructures generally.
Research and utilization of phenomena essential for the growth of (ultra)thin films and self-assembling of nanoobjects (nanofibres, nanotubes, nanodots etc.) with specific properties using PVD (MBE, IBAD, magnetron sputtering), CVD, PECVD and (electro)chemical methods. Attention will be paid both to the study of the initial stages of the growth of thin films and nanostructures that are of vital importance for the parameters and properties of the final products (substrate influence, nucleation, diffusion, growth modes, catalytic activity), and to finding relationships between the parameters and the properties of these products. Selective and guided growth of nanostructures on the substrates patterned by lithographic methods.
Research on the fabrication of nanofibres (especially metallic) from electrolytic solutions using e.g. polymeric and alumina matrices and the development of methods of assembling nanofibres using electrophoresis, etc.
The development of nanolithographic methods by means of electron beam lithography, scanning probe microscopy (e.g. local anodic oxidation), focussed ion beam and their combinations with planar technologies (e.g. selective and guided growth, respectively) for the fabrication of nanostructures with minimum dimensions as close to 10 nm as possible.
Selective deposition of Au coloids
Negative (top) and positive (bottom) deposition of 20 nm gold nanoparticles after patterning Si substrate with Ga ion beam and immersion in the 3mM HF-modified Au colloidal solution.
Investigation of the functional properties of nanostructures
The main goal is to find correlations between the properties and the geometrical and structural parameters of nanostructures and to use this knowledge for feedback in the technology of their preparation and for various applications.
Magnetic nanostructures
The fabrication of magnetic 2D-0D ordered nanostructures and ultrathin-layered structures utilizing the combination of 3D metals and nonmagnetic materials. An experimental and theoretical study of magnetic anisotropy, transport properties (e.g. GMR, TMR) and the dynamics of domain walls and vortexes for applications in magnetic recording, sensing and spintronics.
Spin valve nanowires
Nanostructures for plasmonics
The fabrication and study of the properties of metallic nanostructures and microstructures suitable for plasmonics. Research on the generation, detection and application of surface plasmon polaritons. Simulation and experimental verification of localized surface resonances (localized surface plasmons) on metallic nanoparticles, nanowires and nano/micro antennas. The influence of dielectric materials (spacers) between metallic components of plasmonic structures. Applications in micro and nanosensors (including biosensors).
Top and side views of Ge NWs grown on Ge(100) and Ge(111) substrates.
The scale bars represent 1 mm, in insets 200 nm.
Ultrathin films and nanostructures of wide-band gap semiconductors
The fabrication of semiconductor nitride ultrathin films and nanostructures (GaN, AlN) at low and medium temperatures. A study of their electronic structures. The electric transport properties and optoelectronic properties of 0D nanostructures.
Research group SITE
list / cards
Name and position |
Phone |
|
---|---|---|
Filip Ligmajer Ph.D. student |
+420 54114 3349 | |
Pavel Procházka Ph.D. student |
+420 54114 2817 | |
Jakub Sadílek Ph.D. student |
+420 54114 2788, +420 777 176 639 | |
Kirill Andrejevič Ermakov Ph.D. student |
, +420 774 191 329 | |
Martin Hrtoň Ph.D. student |
, +420 739 159 589 | |
Martin Konečný Ph.D. student |
||
Prof. Tomáš Šikola Research Program Coordinator |
+420 54114 2707 | |
Prof. Jiří Spousta, Ph.D. Senior Researcher |
+420 54114 2848 | |
Michal Kvapil, Ph.D. Junior researcher |
+420 54114 3349 | |
Miroslav Kolíbal, Ph.D. Junior Researcher |
+420 54114 9243 | |
Vlastimil Křápek, Ph.D. Junior Researcher |
+420 54114 2810 | |
Zuzana Lišková, Ph.D. Core Facility Operator |
+420 54114 9217 | |
Jindřich Mach, Ph.D. Junior Researcher |
+420 54114 2813 | |
Věra Melkesová Administrative Support |
+420 54114 2823 | |
Michal Potoček, Ph.D. Junior Researcher |
+420 54114 2814, +420 726 812 814 | |
Josef Polčák, Ph.D. Core facility operator |
+420 54114 9213 | |
Stanislav Průša, Ph.D. Senior Researcher |
+420 54114 2832, +420 732 113 816 | |
Tomáš Šamořil Core facility operator |
+420 54114 9214, +420 724 228 591 | |
Dalibor Šulc, Ph.D. Core facility operator |
+420 54114 9257 | |
Michal Urbánek, Ph.D. CEITEC Nano Group leader |
+420 54114 9200 | |
Vojtěch Uhlíř, Ph.D. Junior Researcher |
+420 54114 9220 | |
Stanislav Voborný, Ph.D. Junior Researcher |
+420 54114 2783 | |
Prof. Peter Varga Senior Researcher |
||
Jakub Zlámal, Ph.D. Junior Researcher |
+420 54114 2788 | |
Oto Lipovský Support Staff |
+420 54114 2834 | |
Tomáš Pejchal Ph.D. student |
||
Bruno Sedláček Support Staff |
+420 54114 2784 | |
Jitka Strouhalová Technician |
||
Petr Bábor, Ph.D. Junior Researcher |
+420 54114 2783 | |
Miroslav Bartošík, Ph.D. Junior Researcher |
+420 54114 2814 | |
Eva Kolíbalová, Ph.D. Core facility operator |
+420 54114 9215 | |
Lukáš Flajšman Ph.D. student |
||
Jan Čechal, Ph.D. Junior researcher group leader |
+420 54114 2810 | |
Michal Horák Ph.D. student |
||
Michal Horký Ph.D. student |
||
Meena Dhankhar Ph.D. student |
+420 51414 2849 | |
Libuše Dittrichová Junior Researcher |
+420 54114 2829 | |
Prof. Petr Dub Senior Researcher |
+420 54114 2708 | |
Vítězslav Duma Support Staff |
+420 54114 2784 | |
Marek Vaňatka Ph.D. student |
||
Radek Kalousek, Ph.D. Senior Researcher |
+420 54114 2783 | |
Jan Neuman, Ph.D. Junior researcher |
+420 54114 2779, +420 54114 2779 | |
Dana Chatrná Administrative Support |
+420 54114 2821 | |
Michal Pavera, Ph.D. Junior researcher |
+420 54114 2811 | |
Petr Skalka, Ph.D. Junior Researcher |
+420 54114 2869 | |
Jiří Babocký Ph.D. student |
||
Jon Ander Arregi Uribeetxebarria Junior researcher |
||
Zoltán Édes Ph.D. student |
||
Jiří Liška Junior researcher |
||
Lukáš Kormoš Ph.D. student |
||
Jakub Piastek Ph.D. student |
||
Vojtěch Švarc Core Facility operator |
+420 54114 9257 | |
Michal Kotoul Senior Researcher |
+420 54114 2889, +420 54114 5206 | |
Jaroslav Maniš Ph.D. student |
||
Lukáš Kejík Ph.D. student |
||
Lukáš Kachtík Ph.D. student |
||
Anton Olegovich Makoveev laboratory technician |
||
Ondřej Metelka |
||
Miloš Hrabovský |
||
Božena Čechalová project manager |
+420 54114 9261 | |
Jakub Hrubý Ph.D. student |
||
Antonín Sojka Ph.D. student |
||
Artur Solodovnyk Ph.D. student |
||
Michal Staňo junior researcher |
||
Viktor Badin Laboratory technician |
||
Zdeněk Nováček Junior researcher |
+420 54114 2811, +420 54114 2782 | |
Jakub Piastek |
||
Artur Solodovnyk Ph.D. student |
The experimental facilities of the group are mainly located in clean rooms (class < 100 000). They include the following equipment:
Dual ion beam HV apparatus for ion-beam assisted deposition and ion-beam etching; complex UHV apparatus for deposition and in situ analysis of ultrathin films with four effusion cells for molecular beam deposition, a hyperthermal ion-beam source for direct ion beam deposition, and surface analytical techniques (SIMS, TOF-LEIS, XPS, TDS, LEED, RHEED, spectroscopic ellipsometry); two commercial scanning probe microscopes (AutoProbe Veeco, NT-MDT Ntegra) providing various modes such as AFM, LFM, conductive AFM, EFM, Kelvin probe, nanolithography mode and in case of NT-MDT microscope also a near field mode (SNOM) providing illumination and collection operational regimes both in reflection or transmission (inverted microscope) measuring schemes; FIB system (Tescan Mira), microreflection spectrometer; a setup for magnetooptical Kerr effect, etc. Other instruments such as standard and confocal optical microscopes and a scanning electron microscope with a lithographic option (Tescan – Vega) are available in the labs outside of the clean rooms.
29. ledna 2018 9:46
LECTURE: Dr. Ondrej Hovorka: Models of magnetic nanoparticles for biomedical applications
25. ledna 2018 18:21
WHEN: 30. 01. 2018 WHERE: CEITEC BUT, Purkynova 123, large meeting room SPEAKER: Dr Andriy Marko TALK: Advances in PELDOR…