Development of Methods for Analysis and Measuring - Petr Klapetek

Research areas

• Quantitative scanning probe microscopy
• Metrology
• Numerical methods in nanoscale metrology

Main objectives

• Research and development of analytical and measurement methods
• Development of the techniques and methodologies for microscopy, analysis and metrology of nanomaterials/nanostructures, and for diagnostics of their properties – new techniques in nanometrology with SPM, optical methods, and combinations of other techniques (SEM, AFM, etc.).

Content of research

Research and development of instruments and methods for the investigation of nanomaterials and nanostructures

Development of methods and methodologies for the analysis and metrology of nanomaterials, nanostructures, for measuring their properties and the development of new analytical/diagnostic equipment and components. Testing manufacturing results of other CEITEC research groups. To surpass the limits of individual methods and the ambiguities of their results on the local characterization of individual nanoobjects, the combinations of other analytical techniques and procedures will be tested as well (e.g. SEM and SPM).

Development of SPM for application in nanometrology

Development of SPM methodology for application in nanometrology focussing on combination of different physical quantities determination and numerical modelling, including advanced scanning probe microscopy methods (scanning thermal microscopy, scanning near field optical microscopy, etc.).

Development of a scanning probe microscope (SPM) attached to a combined 3D optical interferometer. The key element of the equipment will be a unique instrument – nano-positioning and measuring machine for measuring and positioning with an accuracy in the order of a tenth of a nm (using a laser interferometer). The instruments will be used to provide new standards in nanometrology.

list / cards

Name and position	E-mail	Phone
Nupinder Jeet Kaur Junior researcher
David Nezval Student Ph.D.
Miroslav Valtr, Ph.D. Junior researcher
Petr Klapetek, Ph.D. Senior Researcher		+420 54555 5218, +420 734 423 706

SELECTED PUBLICATIONS

2017

• KLAPETEK, P; MARTINEK, J; GROLICH, P; VALTR, M; KAUR, NJ, 2017:Graphics cards based topography artefacts simulations in Scanning Thermal Microscopy. INTERNATIONAL JOURNAL OF HEAT AND MASS TRANSFER 108 , p. 841 - 850.
• KLENOVSKY, P; ZUDA, J; KLAPETEK, P; HUMLICEK, J, 2017:Ellipsometry of surface layers on a 1-kg sphere from natural silicon. APPLIED SURFACE SCIENCE 421 , p. 542 - 546.

2016

• STADLER, P; FARKA, D; COSKUN, H; GLOWACKI, ED; YUMUSAK, C; UIBERLACKER, LM; HILD, S; LEONAT, LN; SCHARBER, MC; KLAPETEK, P; MENON, R; SARICIFTCI, NS, 2016:Local order drives the metallic state in PEDOT:PSS. JOURNAL OF MATERIALS CHEMISTRY C 4 (29), p. 6982 - 6987.

2015

• KLAPETEK, P; VALTR, M; PICCO, L; PAYTON, OD; MARTINEK, J; YACOOT, A; MILES, M, 2015:Large area high-speed metrology SPM system. NANOTECHNOLOGY 26 (6)
• MARTINEK, J; KLAPETEK, P; CAMPBELL, AC, 2015:Methods for topography artifacts compensation in scanning thermal microscopy. ULTRAMICROSCOPY 155 , p. 55 - 61.

2014

• KLAPETEK, P; NECAS, D, 2014:Independent analysis of mechanical data from atomic force microscopy. MEASUREMENT SCIENCE & TECHNOLOGY 25 (4)
• NECAS, D; CUDEK, V; VODAK, J; OHLIDAL, M; KLAPETEK, P; BENEDIKT, J; RUGNER, K; ZAJICKOVA, L, 2014:Mapping of properties of thin plasma jet films using imaging spectroscopic reflectometry. MEASUREMENT SCIENCE & TECHNOLOGY 25 (11)

2013

• KLAPETEK, P; PICCO, L; PAYTON, O; YACOOT, A; MILES, M, 2013:Error mapping of high-speed AFM systems. MEASUREMENT SCIENCE & TECHNOLOGY 24 (2)
• NECAS, D; KLAPETEK, P, 2013:One-dimensional autocorrelation and power spectrum density functions of irregular regions. ULTRAMICROSCOPY 124 , p. 13 - 19.

2012

• FOJT, L; KLAPETEK, P; STRASAK, L; VETTERL, V, 2012:Fibrinogen and cellular adherability on differently treated titanium as implants. CENTRAL EUROPEAN JOURNAL OF PHYSICS 10 (1), p. 232 - 238.
• KLAPETEK, P; VALTR, M; BURSIK, P, 2012:Non-equidistant scanning approach for millimetre-sized SPM measurements. NANOSCALE RESEARCH LETTERS 7
• KLAPETEK, P; VALTR, M; DUCHON, V; SOBOTA, J, 2012:Voice coil-based scanning probe microscopy. NANOSCALE RESEARCH LETTERS 7 , p. 1 - 7.
• LAZAR, J; HRABINA, J; SERY, M; KLAPETEK, P; CIP, O, 2012:Multiaxis interferometric displacement measurement for local probe microscopy. CENTRAL EUROPEAN JOURNAL OF PHYSICS 10 (1), p. 225 - 231.

2011

• BURSIKOVA, V; BLAHOVA, O; KARASKOVA, M; ZAJICKOVA, L; JASEK, O; FRANTA, D; KLAPETEK, P; BURSIK, J, 2011:MECHANICAL PROPERTIES OF ULTRANANOCRYSTALLINE THIN FILMS DEPOSITED USING DUAL FREQUENCY DISCHARGES. CHEMICKE LISTY 105 , p. S98 - S101.
• KLAPETEK, P; KOENDERS, L, 2011:Nanoscale metrology. MEASUREMENT SCIENCE & TECHNOLOGY 22 (9)
• KLAPETEK, P; VALTR, M; NECAS, D; SALYK, O; DZIK, P, 2011:Atomic force microscopy analysis of nanoparticles in non-ideal conditions. NANOSCALE RESEARCH LETTERS 6

2010

• DANZEBRINK, HU; KOENDERS, L; PICOTTO, GB; LASSILA, A; WANG, SHH; KLAPETEK, P, 2010:Final report on EUROMET.L-S15.a (EUROMET Project 925): Intercomparison on step height standards and 1D gratings. METROLOGIA 47

GRANTY

• Research and development of new technologies for the production of a bipolar transistor with insulated gate (TIGBT) (TH01010419), EPSILON, 2015 - 2017
• Deposition of thermomechanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges (GA202/07/1669), Czech Science Foundation - Standard Grants, 2007 - 2011
• Analysis of the optical properties of solar cells (FT-TA3/142), Ministry of Industry and Trade - TANDEM, 2006 - 2009
• Nanometrology using methods of scanning probe microscopy (KAN311610701), Academy of Sciences of the Czech Republic - Nanotechnologies for Society, 2007 - 2011

CURRENT RESEARCH INFRASTRUCTURE

The methods of scanning probe microscopy (AFM, STM, MFM, EFM, SThM, NSOM) for commercial and custom devices.

Numerical simulation of distributed computing systems and supercomputers consisting of graphics cards.

Nanpositioning and Nanomeasuring machine (NMM1, Sios) for SPM, optical and tactile mesurements with single nanometer resolution up to centimeter range.